Near-field optics with phononic and plasmonic materials
Description |
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Prof. Gennady Shvets, Center for Accelerator & Particle Physics, Illinois Institute of Technology, explains that the wave nature of light places a fundamental resolution limit on optical lithography; features and objects much smaller than the wavelength of light are hard to produce and image. He describes a new technique, Phonon Enhanced Near-Field Lithography in Infrared (PENFIL), that utilizes thin films of polaritonic materials (such as SiC, ZnSe, GaP) to dramatically enhance the near-field resolution. Enhancement is realized through resonant coupling to the surface phonon polaritons which exist near the material/vacuum interface. Other applications, such as making miniature accelerators and fabricating left-handed materials, are also described. |
Details |
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Title |
Near-field optics with phononic and plasmonic materials |
Creator |
Shvets, G. |
Creator |
University of California, Berkeley. Department of Physics. |
Published |
2003. |
Full Collection Name |
UCB Physics Department Lectures |
Subject (Topic) |
Near-field microscopy Congresses. Microlithography Congresses. Phonons Congresses. Polaritons Congresses. |
Type |
Video |
Extent |
1 streaming video file |
Other Physical Details |
digital, sd., col. |
Archive |
Physics Library |
Note |
Originally produced as a VHS in 2003. |
Usage Statement |
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Collection |
Physics Lectures |
Tracks |
lectures/phys039.mp4 |
Linked Resources |
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